M, B. Electrical Field Engineering of a Metal Capping Layer for Enhanced Oxide Thin-Film Transistor Performance. NanoNEXT, [S. l.], v. 7, n. 2, p. 12–20, 2026. DOI: 10.54392/nnxt2622. Disponível em: https://journals.asianresassoc.org/index.php/nanonext/article/view/7327. Acesso em: 29 apr. 2026.