Abstract

Plasma-assisted synthesis methods offer a flexible, low-temperature and eco-friendly way to create nanomaterials with specific properties. This paper examines the basic interactions between plasma and materials that enable the creation and functionalization of advanced materials. We categorize plasma sources into four main types: DC, RF, microwave and dielectric barrier discharge (DBD). We also compare high- and low-temperature systems, focusing on how they deliver energy and create reactive particles. The review highlights plasma-liquid interfaces where solvated electrons and radicals allow for single-step, surfactant-free synthesis of metal nanoparticles. The paper explains how plasma induces etching, doping and defect formation in various materials such as catalysts, metal-organic frameworks (MOFs), quantum dots and 2D materials like graphene, hexagonal boron nitride (h-BN) and diamond. Plasma processes provide accurate control over nanoparticle dispersal, activating catalytic sites, generating quantum emitters and altering 2D heterostructures. However, challenges remain in scaling up these processes with controlling plasma in real time and maintaining the stability of treated surfaces. Finally, we discuss future prospects including integrating AI into plasma systems, greener starting materials and employing in-situ diagnostics. These advancements position plasma processing as a vital technology for developing scalable, programmable and multifunctional nanomanufacturing platforms.

Keywords

Plasma Processing, 2D, Nanoparticles, Metal Organic Frameworks (MOFs),

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